The Musée des Arts Décoratifs was transformed into a modern vision of the archetypal Japanese interior complete with iconic tatami mats and statement-making ikebana compositions. The H&M Studio Spring 2018 collection featured clean silhouettes, a relaxed vibe and a striking abstract print inspired by the Japanese writing system. Workwear tailoring, free-flowing fabrics and statement knits also added to the sense of balance between minimalistic design, pure colours and movement. The catwalk show championed a diverse cast including Adwoa Aboah, Amber Valletta, Grace Elisabeth and Edie Campbell.
“It was exciting to see our strong statement of print and colour with clean lines inspired by Japanese design. Together with the authentic setting, tableware, decorations and other details, there was a quiet grace that really shone through, and we can’t wait to see how our customers around the world will be styling their favourite pieces,” said Pernilla Wohlfahrt, H&M’s Design Director.
The beauty look for the show was created by the make-up artist Isamaya Ffrench using products from H&M Beauty. To complement the collection, the beauty look was clean, fresh and minimalistic, with a pop of colour on the eyes. The make-up had a simple, effortless look, reflecting the wearability of the collection.
Guests including Naomie Harris, Alexa Chung and Joan Smalls were first treated to a chic Japanese dinner before the runway show took place amid the maze of tables.